Precision cleaning apparatus and method
AssigneeSandia Corporation
InventorsThomas W. Schneider, Gregory C. Frye, Stephen J. Martin
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AssigneeSandia Corporation
InventorsThomas W. Schneider, Gregory C. Frye, Stephen J. Martin
Estimating the term…
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
Apparatus for precision cleaning of an accumulation of at least one contaminant from a surface of a workpiece during contact with a cleaning medium, the apparatus comprising:
A cleaning monitor for determining an effectiveness of precision cleaning of an accumulation of at least one contaminant from a surface of a workpiece in contact with a cleaning medium within a cleaning zone comprising:
Apparatus for precision cleaning of an accumulation of a contaminant from a surface of a workpiece during contact with a cleaning medium, the apparatus comprising:
Apparatus for precision cleaning of a contaminant from a workpiece comprising:
Apparatus for precision cleaning of a contaminant from a workpiece comprising:
Dependencies are inferred from the claim text.