Apparatus for detecting a mark pattern on a substrate
AssigneeNikon Corporation
InventorNaomasa Shiraishi
Life of this patent
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AssigneeNikon Corporation
InventorNaomasa Shiraishi
Estimating the term…
Illuminating light at a pupil plane of an illumination optical system for illuminating a position detection mark on a substrate is limited to an annular area centered at an optical axis, and a member substantially blocks an image-forming light beam distributed over an area on a pupil plane of an image-forming optical system for forming an image of the position detection mark on an imaging device by receiving light generated from the mark, the area being in image-forming relation to the annular area on the pupil plane of the illumination optical system. Alternatively, a member gives a phase difference of approximately .pi./2 rad! between the image-forming light beam distributed over the area which is in image-forming relation to the annular area on the pupil plane of the illumination optical system and the image-forming light beam distributed over the area other than that area.
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
A position detecting apparatus comprising:
Dependencies are inferred from the claim text.