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US 5,706,077 AGranted
Scan type projection exposure apparatus and microdevice manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorYasuyuki Unno
Life of this patent
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Abstract
A scanning projection exposure apparatus includes an imaging system for imaging a pattern of an original, placed on an object plane, upon a substrate, and a scanning device for relatively scanning the original and the substrate relative to the imaging system, wherein the imaging system provides different imaging positions with respect to a direction of an optical axis, to plural zones on the object plane, which zones are juxtaposedly defined along a direction of scan.
Claims12
A scanning projection exposure apparatus, comprising:
- imaging means for illuminating an original with illumination light and for projecting a pattern of the illuminated original onto a substrate through a projection optical system;
- and
- scanning means for relatively scanning the original and the substrate relative to said imaging means, in a direction perpendicular to an optical axis of said protection optical system,
- wherein the illumination light defines an illumination region upon the original, the pattern of the original being scanned moves through different locations within the illumination region, and said imaging means is arranged so that, for projection of the pattern of the original at the different locations within the illumination region, the pattern is imaged at different imaging positions, being different with respect to the direction of the optical axis of said projection optical system.
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Dependencies are inferred from the claim text.