LC element comprising a reverse biased pn junction
AssigneeT.I.F. Co., Ltd.
InventorsTakeshi Ikeda, Akira Okamoto
Life of this patent
Estimating the term…
Loading patent…
AssigneeT.I.F. Co., Ltd.
InventorsTakeshi Ikeda, Akira Okamoto
Estimating the term…
An LC element for use with a semiconductor device features excellent attenuation characteristics. The element includes a pn junction that has a predetermined shape and which is formed near the surface of a semiconductor substrate. The predetermined shapes include a spiral shape, a meander shape, a straight shape, and a curved shape. An inductor electrode is formed on the pn junction, and the pn junction is reverse biased with a specified voltage to form a distributed capacitor having a desired capacitance. One of the p and n layers functions as an inductor. The element is easily manufactured and requires minimal assembly, and may also be integrally formed as part of an IC or LSI device.
An LC element comprising:
An LC element comprising
An LC element comprising:
An LC element comprising:
An LC element comprising:
An LC element comprising:
An LC element manufacturing method comprising the steps of:
A method of making an LC element, comprising:
A method of making an LC element, comprising:
An LC element formed in a portion of a semiconductor substrate comprising:
An LC element formed in a portion of a semiconductor substrate comprising:
An LC element manufacturing method comprising the steps of:
A method of making an LC element, comprising:
Dependencies are inferred from the claim text.