Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
AssigneeEastman Kodak Company
InventorsPaul Richard West, Eugene Lynn Sheriff, Jeffrey Allen Gurney, Ralph Scott Schneebeli, Thomas Robert Jordan, Gary Roger Miller
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Abstract
An infrared imaging composition contains two essential components, namely an infrared absorbing compound, and a phenolic resin that is either mixed or reacted with an o-diazonaphthoquinone derivative. These compositions are useful in photosensitive elements such as lithographic printing plates that can be adapted to direct-to-plate imaging procedures.
Claims19
A negative-working photosensitive composition consisting essentially of:
- a) (i) a mixture of a phenolic resin and an o-diazonaphthoquinone derivative,
- (ii) a reaction product of a resin and an o-diazonaphthoquinone reactive derivative, or
- (iii) a mixture of (i) and (ii), and
- b) a compound that absorbs infrared radiation having a maximum absorption wavelength greater than about 750 nm, said compound being 2-2-2-chloro-3-(1,3-dihydro-1,1,3-trimethyl-2H-benze!indol-2-ylidene)e thylidene-1-cyclohexen-1-yl!ethenyl!-1,1,3-trimethyl-1H-benze!indolium, salt with 4-methylbenzenesulfonic acid.
The composition of claim i wherein said o-diazonaphthoquinone derivative is 2,4-bis(2-diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonyloxy)benzophenone, 2 -diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonyloxy-2,2-bis(hydroxyphenyl)pro pane monoester, the hexahydroxybenzophenone hexaester of 2-diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonic acid, 2,2'-bis(2-diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonyloxy)biphenyl, 2,2',4,4'-tetrakis(2-diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonyloxy)biph enyl, 2,3,4-tris(2-diazo-1,2-dihydro-1-oxo-5-naphthalenesulfonyloxy)benzophenone , 2,4-bis(2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyloxy)benzophenone, 2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyloxy-2,2-bis hydroxyphenylpropane monoester, the hexahydroxybenzophenone hexaester of 2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonic acid, 2,2'-bis(2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyloxy)biphenyl, 2,2',4,4'-tetrakis(2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyloxy)biph enyl or 2,3,4-tris(2-diazo-1,2-dihydro-1-oxo-4-naphthalenesulfonyloxy)benzophenone
A photosensitive element consisting essentially of a support having thereon a negative-working photosensitive layer consisting essentially of:
- a) (i) a mixture of a phenolic resin and an o-diazonaphthoquinone derivative,
- (ii) a reaction product of a resin and an o-diazonaphthoquinone reactive derivative, or
- (iii) a mixture of (i) and (ii), and
- b) a compound that absorbs infrared radiation having a maximum absorption wavelength greater than about 750 nm, said compound being 2-2-2-chloro-3-(1,3-dihydro-1,1,3-trimethyl-2H-benze!indol-2-ylidene)e thylidene-1-cyclohexen-1-yl!ethenyl!-1,1,3-trimethyl-1H-benze!indolium, salt with 4-methylbenzenesulfonic acid.
A lithographic printing plate consisting essentially of a grained and anodized aluminum support having thereon, as the outer layer, a single negative-working layer comprising a photosensitive composition consisting essentially of a reaction product of a phenol-formaldehyde novolak resin and 2-diazo-1,2-dihydro-1-oxo-4 or -5-naphthalenesulfonyl chloride, and 2-2-2-chloro-3-(1,3-dihydro-1,1,3-trimethyl-2H-benze!indol-2-ylidene)e thylidene-1-cyclohexen-1-yl!ethenyl!-1,1,3-trimethyl-1H-benze!indolium, salt with 4-methylbenzenesulfonic acid.
Dependencies are inferred from the claim text.