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US 5,705,298 AGranted
Holographic method for generating three dimensional conformal photo lithographic masks
AssigneeLucent Technologies Inc.
InventorGeorge Knoedl, Jr.
Life of this patent
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Abstract
A three-dimensional photo mask is formed from a substrate having a first side and a three-dimensional side. A holograph is provided on the first side of the substrate. The three-dimensional side of the substrate has a photosensitive resist material provided thereon. The holograph includes information that defines features to be imaged onto the photosensitive resist material. A method and a system are disclosed for producing the three-dimensional mask.
Claims10
A method of forming a mask, comprising the steps of:
- providing a transparent substrate having a first, planar side and an opposing, three-dimensional side, the three-dimensional side conforming to a shape of a workpiece;
- providing a hologram at the planar side of said substrate, said hologram is a Fourier or Fresnell transform of a desired three-dimensional lithographic pattern;
- providing a photosensitive masking material on the three-dimensional side of the substrate;
- placing the substrate having the photosensitive masking material thereon in an index matching liquid;
- irradiating light through the first side of the substrate in a pattern according to said hologram to expose the photosensitive masking material to the desired three-dimensional lithographic pattern, the index matched liquid mitigating internal reflections within the substrate;
- and
- removing undesired portions of the photosensitive masking material from the three-dimensional side of the substrate to form said mask having said lithographic pattern.
4 more elements
A method of forming a mask, comprising the steps of:
- providing a transparent substrate having a planar side and an opposing three-dimensional side, the three-dimensional side conforming to a shape of a workpiece;
- providing a hologram at the planar side of said substrate, said hologram is a Fourier or Fresnell transform of a desired three-dimensional lithographic pattern;
- providing a photosensitive masking material on the three-dimensional side of the substrate;
- irradiating light through the planar side of the substrate in a pattern according to said hologram to expose the photosensitive masking material to the desired three-dimensional lithographic pattern;
- and
- removing undesired portions of the photosensitive masking material from the three-dimensional side of the substrate to form said mask having said lithographic pattern.
3 more elements
Dependencies are inferred from the claim text.