Projection-exposing apparatus with deflecting grating member

A projection-exposing apparatus comprising:

• a mask which has a pattern formed with a pitch P.sub.R ;
• an illuminating optical system for applying illuminating light from a light source to said mask;
• a projection optical system for projecting an image of said pattern onto a photosensitive substrate;
• and
• a deflecting grating member formed with a pitch P.sub.G, disposed between the light source and the pattern of said mask with a predetermined spacing therefrom, for generating .+-.1st-order and higher order diffracted light;
• wherein said pitch P.sub.G of said deflecting grating member is defined in the relation P.sub.G =2P.sub.R.

A projection-exposing apparatus comprising:

• a mask which has a pattern formed with a pitch P.sub.R ;
• an illuminating optical system for applying illuminating light from a light source to said mask;
• a projection optical system for projecting an image of said pattern onto a photosensitive substrate;
• a deflecting grating member formed with a pitch P.sub.G, disposed between the light source and the pattern of said mask with a predetermined spacing therefrom, for generating .+-.1st-order and higher order diffracted light;
• and
• a movable device holding said deflecting grating member and movable in a predetermined direction and/or rotatable in a plane perpendicular to an optical axis of said projection optical system;
• wherein said pitch P.sub.G of said deflecting grating member is defined in the relation P.sub.G =2P.sub.R.

A projection-exposing apparatus comprising:

• a mask which has a pattern formed with a pitch P.sub.R ;
• an illuminating optical system for applying illuminating light from a light source to said mask;
• a projection optical system for projecting an image of said pattern onto a photosensitive substrate;
• the pattern of said mask being comprised of a transmitting portion of which the transmittance to said illuminating light is approximately 1, and a semi-transmitting portion which gives a phase difference of approximately (2m+1).pi.(m being an integer) to the illuminating light transmitted through said transmitting portion and of which the transmittance to said illuminating light is equal to or less than the order of 1/4 of the transmittance of said transmitting portion;
• and
• a deflecting grating member formed with a pitch P.sub.G, disposed between the light source and the pattern of said mask, with a predetermined spacing therefrom, for generating .+-.1st-order and higher order diffracted light;
• wherein said pitch P.sub.G of said deflecting grating member is defined in the relation P.sub.G =2P.sub.R.

A projection-exposing apparatus comprising:

• a mask which has a pattern formed with a pitch P.sub.R ;
• an illuminating optical system for applying illuminating light from a light source to said mask;
• a projection optical system for projecting an image of said pattern onto a photosensitive substrate;
• a scanning system moving said mask and said photosensitive substrate in synchronization with each other, in order to expose said photosensitive substrate with said pattern image;
• and
• a diffraction grating plate formed with a pitch P.sub.G, disposed between the light source and the pattern of the mask for generating, when said illuminating light is incident, .+-.1st-order and higher order diffracted light;
• wherein said pitch P.sub.G of said diffraction grating plate is defined in the relation P.sub.G =2P.sub.R.