System and method for fault analysis of semiconductor integrated circuit

A fault analysis method for a semiconductor integrated circuit, for locating a fault portion in the semiconductor integrated circuit, said method comprising steps of:

• irradiating an electron beam on a semiconductor integrated circuit,
• detecting the amount of secondary electrons emitted from said semiconductor integrated circuit,
• applying a sequence of test patterns to a non-defective semiconductor integrated circuit and a defective semiconductor integrated circuit alternately or simultaneously,
• making a time of application of a selected test pattern to said semiconductor integrated circuit longer than that of other test patterns,
• acquiring a potential distribution image when said selected test pattern is applied to said non-defective semiconductor integrated circuit and said defective semiconductor integrated circuit,
• causing a potential distribution image for said non-defective semiconductor integrated circuit and said defective semiconductor integrated circuit to be displayed in real-time, and
• displaying alternately or simultaneously said potential distribution image for said non-defective semiconductor integrated circuit and said potential distribution image for said defective semiconductor integrated circuit in a same display or in different displays in real-time.