Reduced scratch sensitization in nucleated photographic film
AssigneeSun Chemical Corporation
InventorsJohn F. Pilot, Shirley M. Madamba, Penny M. Mullen
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Abstract
A hybrid lith photographic film substantially resistant to the formation of scratch-related defects that occur during the manufacturing and handling process having an anti-abrasion coating on the silver halide emulsion layer containing a polyalkylene oxide surfactant.
Claims20
A scratch resistant, negative-type, nucleated silver halide photographic material comprising:
- a substrate;
- a first light-sensitive silver halide emulsion layer coated on said substrate, containing at least one nucleator having a derivative of hydrazine;
- and
- an aqueous, gelatin-based, anti-abrasion layer coated on said first layer, said anti-abrasion layer containing a hardening agent and an oligomer, wherein said oligomer has at least one polyalkylene oxide containing 4 to 40 recurring units of ethoxylate and is present in an amount sufficient to scratch-desensitize the photographic material.
A method for producing a scratch resistant, negative-type, nucleated silver halide photographic material comprising:
- coating a substrate with a first layer having a silver halide photographic emulsion containing at least one nucleator having a derivative of hydrazine;
- coating said first layer with an aqueous, gelatin-based, anti-abrasion coating layer containing a hardening agent and an oligomer, wherein said oligomer has at least one polyalkylene oxide containing 4 to 40 recurring units of ethoxylate and is present in an amount sufficient to scratch-desensitize the photographic material;
- and
- drying said coated substrate.
A scratch-desensitizing coating medium for treating a photographic material, said material consisting of a negative-type, nucleated silver halide photographic emulsion on a substrate, wherein said medium comprises:
- an aqueous, gelatin-based solution, having at least one hardening agent and at least one oligomer selected from mono or di phosphate esters of an ethoxylated alkoxide or alkylaryloxide, symmetrical block copolymers having the configuration (i) A-B-A wherein A comprises recurring units of ethoxylate when B comprises recurring units of propoxylate or wherein A comprises recurring units of propoxylate when B comprises recurring units of ethoxylate;
- alkoxylates of ethylene diamine having the configuration (ii) (A-B).sub.2 -Z-(B-A).sub.2 wherein A comprises recurring units of ethoxylate when B comprises recurring units of propoxylate or wherein A comprises recurring units of propoxylate when B comprises recurring units of ethoxylate, and Z, in either case, is tetra substituted ethylene diamino;
- or fluroroalkyl alcohol substituted polyethylene glycols and polysiloxane polyalkylene ether copolymers having recurring block copolymeric units of ethoxylate and propoxylate.
Dependencies are inferred from the claim text.