Photo-imaging resist ink and cured product thereof
AssigneesNippon Kayaku Kabushiki Kaisha, Nippon Polytech Corp.
InventorsMinoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara, Yoneji Sato, Yoko Baba
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AssigneesNippon Kayaku Kabushiki Kaisha, Nippon Polytech Corp.
InventorsMinoru Yokoshima, Tetsuo Ohkubo, Kazunori Sasahara, Yoneji Sato, Yoko Baba
Estimating the term…
There is disclosed a photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) the epoxy resin is represented by the following formula (1): ##STR1## wherein M stands for ##STR2## n is at least 1 on the average; and m is 1 to n on the average. The resist ink is excellent in developability and photosensitivity, while the cured product thereof is excellent in flex resistance and folding resistance, and well satisfactory in adhesion, pencil hardness, solvent resistance, acid resistance, heat resistance, etc.
A photo-imaging resist ink containing (A) an unsaturated group-containing polycarboxylic acid resin which is a reaction product of (c) succinic anhydride with an additive reaction product of (a) an epoxy resin with (b) an unsaturated group-containing monocarboxylic acid, wherein (a) said epoxy resin is represented by the following formula (1):
Dependencies are inferred from the claim text.