Compete hot plate temperature control system for hot treatment
AssigneeTaiwan Semiconductors Manfuacturing Company, Ltd
InventorsChing-Wen Liao, Chin-Chuan Kuo, Chi-Kang Peng, Tsun-Ching Lin
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AssigneeTaiwan Semiconductors Manfuacturing Company, Ltd
InventorsChing-Wen Liao, Chin-Chuan Kuo, Chi-Kang Peng, Tsun-Ching Lin
Estimating the term…
A heat treatment control system to cure a photoresist that is deposited upon a semiconductor substrate is described. The heat treatment system has a hot plate with a heating element and temperature sensing devices that are in close proximity to the semiconductor substrate. The heat treatment system also has a controlling device that will selectively provide an electrical power source to the heating element to heat the semiconductor wafer. The coupling of the heating element to an electrical power source is determined by an electrical signal from one of the temperature sensing devices that have been conditioned and compared to a set temperature signal to provide an error signal. The controlling device will examine the error signal and adjust the temperature. An over temperature alarm circuit is connected to the second temperature sensing device. If the temperature sensing device indicates the temperature of the semiconductor substrate is significantly greater than the set temperature, the over temperature alarm circuit will activate an audible and visual alarm and transfer a over temperature fault signal to the controlling device. A power monitor circuit will determine the presence of the electrical current in the heating element and activate an audible and visual alarm. The operating personnel will disconnect the electrical power source, if there is a over temperature alarm or a power fault alarm.
A heat treatment system to cure a photoresist material deposed upon a semiconductor substrate, wherein said heat treatment is to elevate said semiconductor substrate to a temperature sufficient to cure said photoresist, and wherein said system comprises
A heat treatment control device to regulate a temperature to cure a photoresist material disposed upon a semiconductor substrate, comprising:
The device of claim 4 wherein the heating apparatus comprises:
A method to control the heat treatment apparatus to heat a semiconductor substrate to cure a photoresist deposed upon said semiconductor substrate, comprising the steps of:
Dependencies are inferred from the claim text.