Metal thin film magnetic recording medium and manufacturing method thereof

A metal thin film magnetic recording medium, comprising:

• (i) a non-magnetic substrate;
• (ii) a seed layer on said substrate;
• (iii) an underlying non-magnetic layer, comprising Cr, on said seed layer;
• and
• (iv) a magnetic layer, comprising a Co-alloy having a uni-axial magnetocrystalline anisotropy, on said underlying non-magnetic layer;
• wherein said seed layer comprises a non-magnetic metal alloy, said alloy is amorphous as determined by X-ray diffraction, and the surface of said non-magnetic alloy, opposite said substrate, contains oxygen.

A metal thin film magnetic recording medium, comprising:

• (i) a non-magnetic substrate;
• (ii) a seed layer on said substrate;
• (iii) an underlying non-magnetic layer, comprising Cr, on said seed layer;
• and
• (iv) a magnetic layer, comprising a Co-alloy having a uni-axial magnetocrystalline anisotropy, on said underlying non-magnetic layer;
• wherein said seed layer comprises an Cr-alloy or V-alloy, both said Cr-alloy and V-alloy comprising at least one element selected from the group consisting of Ta, Nb, Si, Al and C, and said Cr-alloy or V-alloy is amorphous as determined by X-ray diffraction.

A metal thin film magnetic recording medium, comprising:

• (i) a non-magnetic substrate;
• (ii) a seed layer on said substrate;
• (iii) an underlying non-magnetic layer, comprising Cr, on said seed layer;
• and
• (iv) a magnetic layer, comprising a Co-alloy having a uni-axial magnetocrystalline anisotropy, on said underlying non-magnetic layer;
• wherein said seed layer comprises a Cr-alloy or V-alloy comprising at least 40 at % Cr or V, and said Cr-alloy or V-alloy is amorphous as determined by X-ray diffraction.