Method for fabricating a silicon semiconductor substrate having an integrated waveguide and an optical fiber coupled thereto

A method for fabricating a silicon semiconductor substrate having an integrated waveguide and an optical fiber coupled thereto, comprising the steps of:

• a) providing an integrated waveguide in a silicon semiconductor substrate;
• b) anisotropically etching a V-shaped groove into said silicon semiconductor substrate aligned with said waveguide;
• c) providing said integrated waveguide with a freely accessible end surface situated opposite the end of the V-shaped groove by producing a recess in the silicon semiconductor substrate, the formation of said recess comprising the steps of:
• 1) anisotropically etching a piece of the semiconductor substrate from the surface of said silicon semiconductor substrate opposite the surface beating said V-shaped groove, wherein said piece is bared down to a region surrounding said integrated waveguide, and wherein said piece remains connected to said waveguide by a V-shaped notch;
• 2) exerting pressure on said piece, causing it to break off at said V-shaped notch, forming said freely accessible end surface of said integrated waveguide as a fracture surface;
• d) inserting an optical fiber into the V-shaped groove, said optical fiber extending up to said freely accessible end surface.