Process for cleaning water and organic solvent based lacquer from equipment using a single solvent mixture

Abstract

Process for cleaning equipment and equipment cleaner for implementing the process. The invention relates to a process for cleaning equipment contaminated with lacquer residues, in which the lacquer residues are removed with a solvent mixture and an equipment cleaner based on a solvent mixture for implementing the process. The solvent mixture contains A) 15-35 wt. % of one or more glycol ethers of the general formula I OH--(CH.sub.2 --CH.sub.2 --O).sub.m --R.sub.1 I where R.sub.1 =C.sub.1-4 -alkyl and m=1 or 2 and B) 65-85 wt. % of one or more aliphatic ketones of the general formula II ##STR1## where R.sub.2=C.sub.1-3 -alkyl and R.sub.3 =C.sub.1-3 -alkyl and R.sub.2 and R.sub.3 may be identical or different.

Dependencies are inferred from the claim text.