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US 5,700,326 AGranted
Microwave plasma processing apparatus
AssigneeCanon Kabushiki Kaisha
InventorsKazumasa Takatsu, Takashi Kurokawa, Hiroshi Echizen, Akio Koganei, Shuichiro Sugiyama, Toshio Adachi
Life of this patent
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Abstract
A microwave plasma processing apparatus comprises a vacuum processing chamber, a substrate disposed within the vacuum processing chamber, a microwave guide coupled to the vacuum processing chamber, and fins for dividing a microwave in the electric field direction. The length of fins are different such that the uniformity of the film thickness distribution on the substrate of large area can be improved.
Claims18
A microwave plasma processing apparatus comprising:
- a vacuum processing chamber which can contain a substrate having at least a surface to be processed;
- a microwave introducing aperture for introducing a microwave into said vacuum processing chamber;
- and
- at least two fins each fin having two ends one end of each fin being arranged adjacent to said microwave introducing aperture at an inner side of said vacuum processing chamber, said fins being arranged in a row which extends from the microwave introducing aperture in a direction parallel to the propagation of the microwave with a space between each fin to divide the microwaves introduced through said microwave introducing aperture;
- wherein the lengths of the fins measured from the ends adjacent to the microwave introducing aperture to the ends furthest from the microwave introducing aperture, are different, and a plane defined at least by the ends of two fins furthest from said microwave introducing aperture is not perpendicular and not parallel to a plane of said microwave introducing aperture.
2 more elements
A microwave plasma processing method comprising:
- disposing a substrate within a vacuum processing chamber which can be evacuated;
- supplying microwave through a microwave introducing aperture into said vacuum processing chamber, wherein the microwave introduced is divided by a member having at least two fins, said fins being arranged in a row which extends from the microwave introducing window in a direction parallel to the propagation of the microwave, each fin having two ends, and said microwave irradiates said substrate, wherein the fins have different lengths measured from the ends adjacent to the microwave introducing aperture to the ends furthest from said microwave introducing aperture, and the end side of said fin furthest from said microwave introducing aperture is not perpendicular to and not parallel to said microwave introducing aperture, thereby producing a plasma within said vacuum processing chamber at an end side of said fin opposite to said microwave introducing aperture.
Dependencies are inferred from the claim text.