Coating device and a method of coating

A coating device for forming a coating film in a predetermined pattern by applying a coating material from a nozzle to a surface of a base material which continuously travels, the nozzle comprising:

• a front block provided upstream with respect to a traveling direction of the base material, a top face of the front block opposing to the traveling base material being a curved face which has a predetermined curvature radius, the front block including a slit extending continuously in a width direction of the base material and discharging a first coating material therethrough;
• and
• a back block provided downstream with respect to the traveling direction of the base material, a top face of the back block opposing to the traveling base material being a flat face, a plurality of discharging openings being provided on the flat face for discharging a second coating material therethrough,
• wherein the base material travels, above the front block, along the curved face while retaining a predetermined distance between the curved face and the base material, and travels over the back block at an angle in the range of .+-.10.degree. with respect to the flat face of the back block, and
• the second coating material discharged through the plurality of discharging openings of the back block is applied on a first coating film of the first coating material to form a second coating film.

A coating device for forming a coating film in a predetermined pattern by applying a coating material to a surface of a base material which continuously travels, the device comprising:

• a nozzle having a flat face on which a plurality of discharging openings are provided for discharging the coating material therethrough;
• and
• a backup member disposed substantially in parallel with the flat face, the backup member supporting the travelling base material,
• wherein a length X3 of the flat face along a travelling direction of the base material, and a length X4 of a base-material travelling region of the backup member along which the base material travels substantially in parallel with the length X3 of the flat face, satisfy the relationship of X4.gtoreq.X3.