Projection exposure apparatus containing an enclosed hollow structure
AssigneeCanon Kabushiki Kaisha
InventorsYukio Tokuda, Yukio Takabayashi
Life of this patent
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Abstract
A projection lens, a reticle stage and a light source optical system are supported by a cast frame above a wafer stage for holding a wafer thereon. A top portion of the cast frame has an enclosed hollow structure in which strengthening ribs are built, thereby substantially increasing the rigidity of the top portion. Since the ribs are built in the top portion of the cast frame, the surface area exposed to the wafer stage is reduced. As a result, there is little chance that the wafer is contaminated by any adherents to the cast frame.
Claims23
A projection exposure apparatus, comprising:
- a projection optical system for projecting a pattern of an original onto a substrate;
- a substrate stage for holding the substrate thereon;
- and
- a support member, being arranged above said substrate stage, for supporting said projection optical system,
- wherein at least a portion of said support member facing said substrate stage has an enclosed hollow structure with at least one built-in strengthening rib.
A projection exposure apparatus, comprising:
- a projection optical system for projecting a pattern of an original onto a substrate;
- a substrate stage for holding the substrate thereon;
- and
- a support member for supporting said projection optical system,
- wherein at least a portion of said support member facing said substrate stage has an enclosed hollow structure with at least one built-in strengthening rib, the enclosed hollow structure being filled with a vibration absorbing material.
A projection exposure apparatus, comprising:
- a projection optical system for projecting a pattern of an original onto a substrate;
- a substrate stage for holding the substrate thereon;
- and
- a support member, comprising a frame formed by casting, for supporting said projection optical system,
- wherein at least a portion of said support member facing said substrate stage has an enclosed hollow structure with at least one built-in strengthening rib.
A projection exposure apparatus, comprising:
- a projection optical system for projecting a pattern of an original onto a substrate;
- a substrate stage for holding the substrate thereon;
- and
- a support member, being arranged above said substrate stage, for supporting said projection optical system, said support member having a plurality of enclosed hollow portions,
- wherein at least a portion of said support member facing said substrate stage has an enclosed hollow structure with at least one built-in strengthening rib, said built-in strengthening rib comprising a path linking the enclosed hollow portions of said support member with each other.
Dependencies are inferred from the claim text.