Advanced exposure apparatus and exposure method using the same

An advanced exposure apparatus comprising:

• a light source;
• an adjusting portion comprising a filter to limit the light emitted from said light source, said filter is formed by combining a quadrupole filter and an annular filter;
• a refractive/diffractive portion for refracting and diffracting the light emitted from said adjusting portion;
• and
• a focussing portion for focussing the light emitted from said refractive/diffractive portion onto a wafer,
• wherein said filter is provided with first group holes and second group holes of the same size, but differing distances from the center of the filter.

An exposure method using an advance exposure apparatus comprising the steps of:

• generating light radiated from a light source as near-off axis light and far-off axis light, respectively, said near-off axis light being filtered through a first group holes disposed a first distance from the center of a filter and said far-off axis light being filtered through a second group holes disposed a second distance from the center of said filter, said second distance being greater than said first distance;
• making said near-off axis light and far-off axis light obliquely incident to a mask pattern;
• and
• focussing the light emitted from said mask pattern onto a wafer.

An exposure method using an advanced exposure apparatus comprising the steps of:

• generating light radiated from a light source as near-off axis light and far-off axis light, using a filter with said first group holes and said second group holes comprising four holes respectively, said filter formed by combining a quadrupole filter and an annular filter;
• making said near-off axis light and far-off axis light obliquely incident to a mask pattern;
• and
• focussing the light emitted from said mask pattern onto a wafer.