Drift-free avalanche breakdown diode
AssigneeRobert Bosch GmbH
InventorNeil A. Davies
Life of this patent
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Abstract
An avalanche breakdown diode includes a p-doped trough in which a highly p-doped region is introduced. In addition to the trough, an n-doped region is introduced, which is underlaid by a p-doped layer. The trough and the p-doped layer define a precisely established interspace. The arrangement is introduced into a p-type substrate. An insulating layer and thereon, in turn, a conductive layer are applied over the region between the trough and the p-doped layer. The conductive layer and the n-doped region are connected to a positive voltage and the highly p-doped region is connected to a negative voltage. A drift of the breakdown voltage is thereby prevented. In addition, the resistance during the breakdown is small due to the defined interspace between the trough and the layer.
Claims5
An avalanche breakdown diode having a p-type substrate, comprising:
- a first p-doped region formed in the p-type substrate;
- a second p-doped region formed in the first p-doped region, the second p-doped region having a doping concentration greater than the first p-doped region;
- a n-doped region formed in the p-type substrate;
- a third p-doped region formed underneath the n-doped region, the third p-doped region and the first p-doped region defining an interspace having a predetermined width and including the p-type substrate, the third p-doped region covering at least a portion of the n-doped region adjacent to the interspace;
- an insulating layer formed over the interspace;
- a conducting layer applied to the insulating layer;
- and
- wherein the second p-doped region is connected to a negative voltage, the n-doped region is connected to a positive voltage and the conductive layer is connected to the positive voltage.
An avalanche breakdown diode having an n-type substrate, comprising:
- a first n-doped region formed in the n-type substrate;
- a second n-doped region formed in the first n-doped region, the second n-doped region having a doping concentration greater than the first n-doped region;
- a p-doped region formed in the n-type substrate;
- a third n-doped region formed underneath the p-doped region, the third n-doped region and the first n-doped region defining an interspace having a predetermined width and including the n-type substrate, the third n-doped region covering at least a portion of the p-doped region adjacent to the interspace;
- an insulating layer formed over the interspace;
- a conducting layer applied to the insulating layer;
- and
- wherein the second n-doped region is connected to a positive voltage, the p-doped region is connected to a negative voltage and the conductive layer is connected to the negative voltage.
Dependencies are inferred from the claim text.