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US 5,691,396 AGranted
Polysiloxane compounds and positive resist compositions
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsKatsuya Takemura, Junji Tsuchiya, Osamu Watanabe, Toshinobu Ishihara
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Abstract
The invention provides a novel polysiloxane compound, typically polyhydroxybenzylsilsesquioxane, having some hydroxyl groups replaced by acetal groups and optionally acid labile groups. The polysiloxane compound is useful as an alkali soluble polymer for positive resist material.
Claims20
A polysiloxane compound of the following general formula (I):
- ##STR33## wherein R is ##STR34## or ##STR35## wherein each of R.sup.1 and R.sup.2 is a hydrogen atom or a normal or branched allyl group having 1 to 6 carbon atoms, R.sup.3 is a normal or branched allyl group having 1 to 6 carbon atoms, R.sup.4 is a hydrogen atom or methyl group,
- Q is an acid labile group,
- letters x, y, and z are numbers satisfying x+y+z=1, x and y are not equal to 0, and
- n is an integer of 1 to 3.
1 more element
Dependencies are inferred from the claim text.