Method of growing single crystal
AssigneeHitachi Chemical Company, Ltd.
InventorsYasushi Kurata, Kazuhisa Kurashige, Hiroyuki Ishibashi
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AssigneeHitachi Chemical Company, Ltd.
InventorsYasushi Kurata, Kazuhisa Kurashige, Hiroyuki Ishibashi
Estimating the term…
A method of growing a crack-free single crystal is disclosed which comprises heating raw materials in a crucible to thereby obtain a melt of the raw materials, contacting a lower end of a seed crystal with the melt and pulling the seed crystal to thereby grow a single crystal, and wherein the melt of the crucible flows from its surface toward its inner part inside the crucible by convection at a position locating outside a region where the growth of the single crystal occurs. This flow control can be achieved by, for example, surrounding the crucible with a heat insulation refractory composed of a pair of semicylindrical refractories disposed so as to provide a circular cross section with differently sized gaps. In the above-mentioned method, the seed crystal may be rotated during a shoulder growth in which the single crystal has its diameter increased from that of the seed crystal to a target diameter at a rotation rate greater than that during a subsequent cylindrical body growth. Further, in the above-mentioned method, during the shoulder growth, the single crystal may have a solid-liquid interface configuration changed from a convex toward the melt to a flatness or a convex toward the seed crystal.
A method of growing a single crystal, comprising the steps of:
A method of growing a single crystal having a cylindrical body with a fixed final diameter, comprising the steps of:
A method of growing a single crystal comprising the steps of:
A method of growing a single crystal having a cylindrical body with a fixed final diameter, comprising the steps of:
A method of growing a single crystal, comprising the steps of:
A method of growing a single crystal, comprising the steps of:
Dependencies are inferred from the claim text.