Apparatus for developing a resist-coated substrate

A developing apparatus for developing a photoresist-coated on substrate, comprising:

• a spin chuck having a mount smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward;
• a cup surrounding the substrate on the mount of the spin chuck;
• a developing solution nozzle for applying a developing solution on the photoresist-coated substrate held on the mount;
• a first washing solution nozzle for applying a washing solution to the photoresist-coated surface of the substrate held on the mount;
• a second washing solution nozzle for applying the washing solution to a rear surface of the substrate on the mount;
• a liquid seal ring mounted substantially coaxial with the spin chuck and having a diameter greater than the mount and smaller than the substrate;
• and
• a liquid film forming section provided on an upper end of the liquid seal ring and located near and opposite a periphery of a rear surface of the substrate on the mount to provide a clearance relative to the periphery of the rear surface of the substrate, wherein
• the liquid film forming section includes
• a first wall portion situated substantially orthogonal to the rear surface of the substrate and in an outwardly facing relation, and
• a second wall portion gently inclined relative to the rear surface of the substrate and situated in an inwardly facing relation,
• the liquid film forming section creates an annular continuous washing solution film at the clearance,
• the first wall portion prevents the developing solution from intruding more inward than the clearance, and
• the second wall portion promotes a discharge of the developing solution from the clearance.