US 5,688,322 A · Apparatus for coating resist on substrate

Abstract

Disclosed is an apparatus for coating resist comprising a spin-chuck capable of moving vertically, holding a substrate received and rotating together with the substrate, resist solution supplying mean for supplying a resist solution onto a substrate held on the spin-chuck, a rotating cup surrounding the substrate held on the spin-chuck and rotated in synchronism with the spin-chuck, for receiving the resist solution centrifugally separated from the substrate, a drain cup provided around the rotating cup, for receiving a waste material discharged from the rotating cup, the drain cup having a collecting space for collecting the waste material received, a drainage passage having a drainage port opening into the collecting space for discharging a liquid component of the waste material collected in the collecting space therefrom, an exhaust passage having an exhaust port communicating with the collecting space, for discharging a gas component of the waste material collected in the collecting space therefrom, an exhaust gas guiding passage provided at a level higher than at least the drainage port, for guiding the gas component from the collecting space to the exhaust passage, and a gas-liquid separating member provided in the exhaust gas guiding passage, for condensing a liquid component contained in air containing the gas component by striking it against the gas-liquid separating member, thereby preventing the liquid component from going around the exhaust passage.

Claims16

Dependent claims

An apparatus for coating resist comprising:

a spin-chuck which is vertically movable, said spin-chuck holding a substrate received and rotating together with said substrate,
resist solution supplying means for supplying a resist solution onto said substrate held on the spin-chuck;
a rotating cup surrounding the substrate held on said spin-chuck and being rotated in synchronism with said spin-chuck, for receiving said resist solution centrifugally separated from said substrate;
a drain cup provided around said rotating cup, for receiving a waste material discharged from said rotating cup, said drain cup having a collecting space for collecting said waste material received;
a drainage passage having a drainage port opening into said collecting space for discharging a liquid component of said waste material collected in said collecting space therefrom;
an exhaust passage having an exhaust port communicating with said collecting space, for discharging a gas component of said waste material collected in said collecting space therefrom;
an exhaust gas guiding passage provided at a level higher than at least said drainage port, for guiding said gas component from said collecting space to said exhaust passage;
and
a gas-liquid separating member provided in said exhaust gas guiding passage, for condensing a liquid component contained in an air flow containing said gas component by striking it against said gas-liquid separating member, thereby preventing said liquid component from going around said exhaust passage.

6 more elements

Dependencies are inferred from the claim text.

Apparatus for coating resist on substrate

Life of this patent

Apparatus for coating resist on substrate

Life of this patent

Abstract

Claims16