Metal sputtering target assembly
AssigneeJohnson Matthey Electronics, Inc.
InventorsRoger Alan Emigh, William Bryce Willett
Life of this patent
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Abstract
Described is a method of manufacturing a sputtering target or backing plate for a sputtering target that minimizes metal waste and reduces manufacturing steps. The target or backing plate is made from a substantially circular metal blank by progressively deforming circumferential bands until the blank is in the shape of a sputtering target or backing plate. The target and backing plate so produced are also described.
Claims16
A method of making a metal sputtering target assembly comprising a sputtering target having a top which includes a target surface, having substantially the same microstructure as the metal from which the target surface is made, and an extension, comprising:
- providing a metal blank;
- clamping the metal blank between a rotatable spindle and a die;
- rotating the metal blank and the die;
- and
- deforming the metal blank by progressively applying pressure to a discrete area of the blank while rotating and continuing to apply pressure at differing radials of the blank to form the extension and the flange without causing disruption of the microstructure of the metal at the target surface, whereby the microstructure of the target surface is substantially the same as the microstructure of the metal blank from which it is made.
A method of forming a metal sputtering target assembly comprising a target surface having substantially the same microstructure as the metal from which the target surface is made, an extension and flange comprising:
- providing a metal blank;
- clamping the metal blank between a rotating spindle and a die;
- and
- spinforming the metal blank into a shape having a top including a target surface, an extension extending away from the top, and a flange extending from the extension without causing disruption of the microstructure of the metal at the target surface, whereby the microstructure of the target surface is substantially the same as the microstructure of the metal blank from which it is made.
A method of manufacturing a sputtering target assembly having a top comprising a target surface, an extension from the top, and a flange extending from the extension, said target surface having a desired microstructure for sputtering, comprising:
- providing a metal blank,
- clamping the metal blank between a rotatable spindle and a die;
- rotating the metal blank and the die;
- and
- deforming the metal blank by progressively applying pressure to a discrete area of the blank while rotating and continuing to apply pressure at differing radials of the blank to form the extension and the flange without disturbing the microstructure of the target surface, whereby the microstructure of the target surface is substantially the same as the microstructure of the metal blank from which it is made.
Dependencies are inferred from the claim text.