Positive photoresist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsShiro Tan, Shinji Sakaguchi
Life of this patent
Estimating the term…
Abstract
Provided is a positive photoresist composition comprising (A) an alkali-soluble resin prepared by condensation of aldehydes and a mixture of phenols, which comprises (i) thymol, isothymol or a thymol-isothymol mixture and (ii) one or more of a phenol compound represented by the following formula (I); ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group, and optionally, as a third monomer, (iii) a phenol compound other than m-cresol; (B) 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent; and (C) a low molecular weight compound having from 12 to 50 carbon atoms in all and from 2 to 8 phenolic hydroxy groups.
Claims12
A positive photoresist composition comprising:
- (A) 100 parts by weight of an alkali-soluble resin prepared by condensation of aldehydes and a phenol compound mixture which comprises (i) thymol, isothymol or a thymol-isothymol mixture, and (ii) one or more of a phenol compound represented by the following formula (I);
- ##STR10## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group,
- and optionally, as a third monomer, (iii) a phenol compound other than m-cresol;
- (B) from 30 to less than 130 parts by weight of 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent;
- and
- (C) from 20 to less than 60 parts by weight of a low molecular weight compound which contains from 12 to 50 carbon atoms in all and has from 2 to 8 phenolic hydroxy groups.
The positive photoresist composition comprising:
- (A) 100 parts by weight of an alkali-soluble resin prepared by condensation of aldehydes and a phenol compound mixture which comprises (i) thymol, isothymol or a thymol-isothymol mixture, (ii) one or more of a phenol compound represented by the following formula (I);
- ##STR11## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different, and each of them represents a hydrogen atom or a methyl group,
- and as a third monomer, (iii) at least one phenol compound selected from the group consisting of p-cresol, 3,4-xylenol and phenol compounds represented by the following formula (II);
- ##STR12## wherein R.sub.4, R.sub.5, R.sub.6 and R.sub.7 are the same or different, and each of them represents a hydrogen atom or a methyl group;
- (B) from 30 to less than 130 parts by weight of 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic acid esters as photosensitive agent;
- and
- (C) from 20 to less than 60 parts by weight of a low molecular weight compound which contains from 12 to 50 carbon atoms in all and has from 2 to 8 phenolic hydroxy groups.
Dependencies are inferred from the claim text.