Method for depositing a substance with temperature control
AssigneeCelestech, Inc.
InventorsCecil B. Shepard, Jr., Michael S. Heuser, Daniel V. Raney, William A. Quirk, Gregory Bak-Boychuk
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Abstract
A method for depositing a substance, such as diamond, by plasma deposition on a substrate mounted over a madrel cooled by a heat exchange, comprising the steps of: determining the heat flux at the deposition surface of the substrate; providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux; and depositing said substance on said substrate by said plasma deposition.
Claims4
A method for depositing diamond film, comprising the steps of:
- providing a deposition chamber;
- providing, in said chamber, a rotating mandrel having a flat surface;
- directing a plasma containing a hydrocarbon gas and hydrogen gas toward said surface of said mandrel;
- controlling temperature on said surface of said mandrel by passing coolant fluid radially through bores in the mandrel at several angular reference positions in the mandrel, said coolant fluid being passed through said mandrel at an angle of at least 2 degrees with respect to said surface of said mandrel.
A method for depositing a substance by plasma deposition on a substrate mounted over a mandrel cooled by heat exchange, comprising the steps of:
- determining the heat flux at the deposition surface of the substrate;
- providing, between said mandrel and said substrate, a spacer having a thermal conductance in its thickness direction that varies in accordance with said determined heat flux;
- and
- depositing said substance on said substrate by said plasma deposition.
Dependencies are inferred from the claim text.