Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups

A radiation sensitive resin composition containing, in admixture, an alkali soluble resin and a radiational effective amount of at least one 1,2-quinonediazide compound selected from the group consisting of compounds represented by the following formula (1):

• ##STR17## wherein R.sup.1 is an alkyl group having 1 to 3 carbon atoms, a cycloalkyl group, an alkoxyl group having 1 to 3 carbon atoms or an aryl group;
• D is an organic radical having a 1,2-quinonediazide group;
• a is 1;
• b is an integer of 0 to 4;
• A is a single bond, a polymethylene group having 1 to 4 carbon atoms, a cycloalkylene group, a phenylene group, a group represented by the following formula (2):
• ##STR18## a carbonyl group, an ester group, an amide group or an ether group;
• Y is a hydrogen atom, an alkyl group or an aryl group;
• and X.sup.1 and X.sup.2 are the same or different and represented by the following formula (3):
• ##STR19## wherein each of Z.sup.1, Z.sup.2 and Z.sup.3 is the same or different and is an alkyl group, a cycloalkyl group or an aryl group;
• R.sup.2 is an alkyl group, a cycloalkyl group or an alkoxyl group;
• and f is an integer of 0 to 3. ##STR20##