Sputtering device

A sputtering device for uniformly coating a surface of a mobile substrate which enters said device at a downstream position and exits said device at an upstream position, said device comprising:

• a vacuum container having a gas exhausting portion and a gas providing portion, said gas exhausting portion located in said downstream position and said gas providing portion located in said upstream position, said gas providing portion comprising at least one first gas inlet which provides gas into said vacuum container away from said gas exhausting portion, and at least one second gas inlet which provides gas into said vacuum container towards said gas exhausting portion;
• a target provided in said vacuum container between said at least one first gas inlet and said gas exhausting portion;
• a diffusion interval from said target to said at least one first gas inlet, said diffusion interval having a length at least as great as a shortest distance between said target and said mobile substrate;
• substrate transporting means for transporting the mobile substrate through a sputtering zone near said target;
• and
• a plasma producing portion to produce gas plasma near the mobile substrate.

A sputtering device for uniformly coating a surface of a mobile substrate which enters said device at a downstream end and exits said device at an upstream end, said device comprising:

• a vacuum container having a gas exhausting portion and a gas providing portion, said gas exhausting portion located near said downstream end and said gas providing portion located near said upstream end, said gas providing portion comprising at least one first gas inlet, which provides gas into said vacuum container away from said gas exhausting portion;
• a diffusing plate facing said at least one first gas inlet and located a distance from a vacuum container wall for diffusing said gas;
• a target provided in said vacuum container between said at least one first gas inlet and said gas exhausting portion;
• a diffusion interval from said target to said at least one first gas inlet, said diffusing interval having a length at least as great as a shortest distance between said target and said mobile substrate;
• substrate transporting means for transporting the mobile substrate through a sputtering zone near said target;
• and
• a plasma producing portion to produce gas plasma near the mobile substrate.