Central management system of wet chemical stations
AssigneeSamsung Electronics Co., Ltd.
InventorsHeung-soo Park, Hee-sun Chae
Life of this patent
Estimating the term…
Abstract
A central management system for wet chemical cleaning stations includes a number of wet chemical cleaning stations each having a liquid bath, filter, pump and multiple sensors for sensing the process variables thereof; and a main computer connected to the wet chemical cleaning stations to display, store and process data sensed by the sensors and totally manage the data, to thereby enable effective central management of the cleaning process via the main computer.
Claims12
A central management system for wet chemical cleaning stations, comprising:
- a plurality of wet chemical cleaning stations each having a liquid bath, filter, pump and at least one sensor for sensing a process variable thereof;
- and
- a main computer connected to said plurality of wet chemical cleaning stations for displaying, storing and processing data sensed by any one of said at least one sensor and totally managing said data.
A central management system for wet chemical cleaning stations, comprising:
- a plurality of wet chemical cleaning stations each having a liquid bath, a filter, a pump and multiple sensors for sensing processing variables thereof;
- multiple local computers individually connected to each of said plurality of wet chemical cleaning stations to individually manage the data sensed by said multiple sensors;
- and
- a main computer for displaying, storing and processing the data sensed by said multiple sensors, said main computers being connected to said plurality of wet chemical cleaning stations and to said multiple local computers for totally managing said data.
Dependencies are inferred from the claim text.