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AssigneesHirama Rika Kenkyujo Ltd., Nagase & Co., Ltd.
InventorsToshimoto Nakagawa, Kouzo Tsukada, Shu Ogawa, Yoshitaka Sato, Shinichiro Shiotsu
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A resist stripping solution is used in the stripping of resist in a liquid crystal board manufacturing process or semiconductor manufacturing process. The apparatus for controlling the resist stripping solution comprises a resist stripping solution discharge device for discharging resist stripping solution by detecting the dissolved resist concentration in the resist stripping solution using an absorption photometer, first replenishing device for replenishing organic solvent and alkanolamine such as MEA or the like by detecting the liquid level of the resist stripping solution using a liquid level gauge, and second replenishing device for replenishing at least one of organic solvent and alkanolamine such as MEA or the like by detecting the concentration of alkanolamine such as MEA or the like of the resist stripping solution by an absorption photometer. As a result, the quality of the resist stripping solution can always be constant, and the consumption volume of the solution, the operation down time and the cost can be notably reduced.
An apparatus for controlling a resist stripping solution, comprising:
An apparatus for controlling a resist stripping solution, comprising:
An apparatus for controlling a resist stripping solution, comprising:
An apparatus for controlling a resist stripping solution, comprising:
Dependencies are inferred from the claim text.