Plasma producing method and apparatus including an inductively-coupled plasma source

An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising:

• a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma;
• and,
• a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising:
• a dielectric plate having a first surface forming part of an inner wall of said processing chamber;
• a substantially planar induction coil having two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.

A method of processing at least a surface of an article with plasma, comprising the steps of:

• disposing said article in a processing chamber having at least one inlet port through which a process gas may be input;
• introducing said process gas into said processing chamber at a controlled operating pressure;
• coupling a plasma source to an end of said processing chamber to seal said processing chamber and to induce the formation of said plasma, said plasma source comprising:
• a dielectric plate having a first surface forming part of an inner wall of said processing chamber;
• a substantially planar induction coil having at least two spiral portions which are symmetrical about at least one point of said substantially planar induction coil, wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, and wherein said induction coil couples energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.

An apparatus for processing at least a surface of an article with plasma formed from a process gas, comprising:

• a processing chamber defining a processing space and having at least one inlet port through which said process gas may be input into said processing space for processing said article with said plasma;
• and,
• a plasma source coupled to an end of said processing chamber to seal said processing chamber and for inducing the formation of said plasma, said plasma source comprising:
• a dielectric plate having a first surface forming part of an inner wall of said processing chamber;
• a substantially planar induction coil, a first portion of which comprises a first spiral, and a second portion of which comprises a second spiral, wherein said first and second spiral portions are substantially identical and form a continuous "S-shape", and wherein said substantially planar induction coil is disposed on a second surface of said dielectric plate outside said processing chamber, said induction coil for coupling energy through said dielectric plate into said processing space to form said plasma proximate said article surface to produce a substantially uniform process rate across said article surface.