Apparatus for adjusting a gas injector of furnace
AssigneeUnited Microelectronics Corp.
InventorsYu-Tsai Lin, Edward Houn, Ben Chen
Life of this patent
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Abstract
An improved apparatus is provided for adjusting a gas injector of a furnace in connection with oxidation, diffusion and heat treating in semiconductor processing. The apparatus includes a reaction tube for serving as a reaction chamber and heat sink. The gas injector is coupled to the reaction tube on one end and includes openings on the other end for passing source gas. An elongated open tube is secured to the gas injector and has its axis superimposed approximately on the axis of the gas injector.
Claims16
An apparatus for adjusting a gas injector of a furnace in connection with oxidation, diffusion and heat treating in semiconductor processing, the apparatus comprising:
- a reaction tube for protecting a plurality of wafers therein from outside contamination and serving as a heat sink to even out the temperature therein, the gas injector having an axis superimposed approximately on an axis of the reaction tube, the gas injector being coupled to the reaction tube on one end, the gas injector including at least one opening on the other end for passing source gas into the reaction tube;
- and
- an elongated open tube having an axis superimposed approximately on the axis of the gas injector, the elongated open tube including a first end secured to the gas injector and a second end secured to the gas injector at a joint where the gas injector is coupled to the reaction tube.
Dependencies are inferred from the claim text.