2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTomoyoshi Furihata, Motoyuki Yamada
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Abstract
A polyhydroxystyrene having a 2,4-diamino-s-triazinyl group substituted for 1-50 mol % of its hydroxyl group and a weight average molecular weight of 3,000-50,000 is provided. A negative radiation-sensitive resist composition comprising the polymer, preferably along with a photo-acid generator and a crosslinking agent has high resolution and developability, affords a resist pattern of rectangular profile, and is shelf stable. The composition is thus very useful as resist material for LSI manufacture.
Claims3
A negative radiation-sensitive resist composition comprising a 2,4-diamino-s-triazinyl group-containing polymer consisting of 99 to 50 mol % of a unit of the following structural formula (1a) and 1 to 50 mol % of the unit of the following structural formula (1b):
- ##STR7## wherein R is a hydrogen atom or methyl group, R.sup.1 is a 2,4-diamino-s-triazinyl group of the following structural formula (2):
- ##STR8## wherein at least one of R.sup.2, R.sup.3, R.sup.5 and R.sup.5 is an alkoxymethyl group of the structural formula:
- --CH.sub.2 OR.sup.6, wherein R.sup.6 is an alkyl group having 1 to 4 carbon atoms, and the remainder of R.sup.2, R.sup.3, R.sup.5 and R.sup.5 is a hydrogen atom, said polymer having a weight average molecular weight of 3,000 to 50,000.
Dependencies are inferred from the claim text.