Positive photoresist composition containing quinone diazide 5-triazine esterification compound
AssigneeKorea Kumho Petrochemical Co., Ltd.
InventorsDae-Youp Lee, Ki-Dae Kim, Ji Hong Kim, Seong-ju Kim
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Abstract
A positive photoresist composition, including an alkali soluble novolak resin, an esterification compound represented by the following formula II as a photosensitive agent and a solvent: ##STR1## wherein R.sub.1 through R.sub.3 are independently selected from a hydrogen atom, an alkoxy group and an alkyl group containing 1 to 4 carbon atoms and are different from or the same as one another, and x is 1 to 4, 1+m+n+x is 4; B is selected from oxygen, methyl oxygen and ethyl oxygen; and ##STR2##
Claims2
A positive photoresist composition comprising an alkali soluble novolak resin and an esterification compound in an admixture wherein said esterification compound is represented by the following Formula II as a photosensitive agent and a solvent:
- ##STR6## wherein R.sub.1 through R.sub.3 are independently selected from a group consisting of a hydrogen atom, an alkoxy group containing 1 to 4 carbon atoms, and an alkyl group containing 1 to 4 carbon atoms and wherein R.sub.1 through R.sub.3 are different from or the same as one another, and
- x is 1 to 4, 1+m+n+x totals 4 with 1 and m and n each selected from 0 through 3;
- B is selected from a group consisting of oxygen, methyl oxygen and ethyl oxygen;
- and
- D represents ##STR7##
Dependencies are inferred from the claim text.