Process for preparing a color filter
AssigneePolaroid Corporation
InventorsCarl A. Chiulli, John E. MacLatchy, Harris R. Miller
Life of this patent
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Abstract
A substrate (typically a solid state imager or a liquid crystal display device) is provided with a filter by forming a layer of photoresist on the substrate, and exposing and developing the photoresist to produce filter elements from the portions of the layer of photoresist remaining after the development. After development of the layer of photoresist, the substrate is treated with a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the substrate. A preferred silylation compound is hexamethylcyclotrisilizane.
Claims25
In a process for forming a filter on a substrate, which process comprises:
- forming a layer of a photoresist on the substrate;
- exposing portions of the layer of photoresist to radiation effective to change the solubility of the exposed portions of the photoresist;
- developing the exposed layer of photoresist by removing from the substrate one of the exposed and unexposed portions of the layer of photoresist,
- thereby producing filter elements from the remaining portions of the layer of photoresist,
- the improvement which comprises:
- treating the substrate, after formation of the filter elements thereon, with a silylation compound having at least two functional groups, this silylation compound being capable of cross-linking the photoresist, and of promoting adhesion of the photoresist to the substrate.
A process for forming a filter on a substrate, this substrate comprising a solid state imager or a liquid crystal display device, which process comprises:
- forming, on the solid state imager, a layer of a first photoresist composition comprising a photoresist and a first dye;
- exposing portions of the layer of first photoresist composition to radiation effective to change the solubility of the exposed portions of the photoresist composition;
- developing the exposed layer of first photoresist composition by removing from the substrate one of the exposed and unexposed portions of the layer of first photoresist composition,
- thereby producing first filter elements from the remaining portions of the layer of first photoresist composition;
- thereafter, treating the substrate with a silylation compound having at least two functional groups, this silylation compound being capable of cross-linking the photoresist in the first filter elements, and of promoting adhesion of this photoresist to the substrate;
- thereafter forming, on the substrate bearing the first filter elements, a layer of a second photoresist composition comprising a photoresist and a second dye, the second dye having radiation absorption characteristics different from those of the first dye;
- exposing portions of the layer of second photoresist composition to radiation effective to change the solubility of the exposed portions of the photoresist composition;
- developing the exposed layer of second photoresist composition by removing from the substrate one of the exposed and unexposed portions of the layer of second photoresist composition,
- thereby producing second filter elements from the remaining portions of the layer of second photoresist composition;
- thereafter, treating the substrate with a silylation compound having at least two functional groups, this silylation compound being capable of cross-linking the photoresist in the second filter elements, and of promoting adhesion of this photoresist to the substrate;
- thereafter forming, on the substrate bearing the first and second filter elements, a layer of a third photoresist composition comprising a photoresist and a third dye, the third dye having radiation absorption characteristics different from those of the first and second dyes;
- exposing portions of the layer of third photoresist composition to radiation effective to change the solubility of the exposed portions of the photoresist composition;
- developing the exposed layer of third photoresist composition by removing from the substrate one of the exposed and unexposed portions of the layer of third photoresist composition,
- thereby producing third filter elements from the remaining portions of the layer of third photoresist composition;
- and
- thereafter, treating the substrate with a silylation compound having at least two functional groups, this silylation compound being capable of cross-linking the photoresist in the third filter elements.
A solid state imager having a radiation-sensitive surface bearing a filter comprising first, second and third sets of filter elements, these filter elements comprising a photoresist, each of the filter elements having the same radiation absorption characteristics as the other filter elements of the set to which it belongs but different radiation absorption characteristics from the filter elements of the other two sets, and wherein at least one of the sets of filter elements contains a residue of a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the radiation-sensitive surface of the solid state imager.
A liquid crystal display device comprising a plurality of liquid crystal light gates and a viewing surface through which these light gates can be viewed, the viewing surface having a radiation-sensitive surface bearing a filter comprising first, second and third sets of filter elements, these filter elements comprising a photoresist, each of the filter elements having the same radiation absorption characteristics as the other filter elements of the set to which it belongs but different radiation absorption characteristics from the filter elements of the other two sets, and wherein at least one of the sets of filter elements contains a residue of a silylation compound capable of cross-linking the photoresist and of promoting adhesion of the photoresist to the viewing surface.
A process for forming microlenses on a substrate, which process comprises:
- forming first second and third sets of discrete photoresist elements on the substrate, each of the first, second and third sets being of a different color;
- thereafter melting the photoresist elements to form three sets of microlenses on the substrate;
- and
- thereafter treating the substrate with a silylation compound capable of cross-linking the photoresist in the photoresist elements.
Dependencies are inferred from the claim text.