Method of lithography using reticle pattern blinders

A lithographic method comprising:

• providing a lithographic apparatus having partially coherent or off-axis illumination;
• forming a reticle configured for use with the lithographic aparatus to project a primary pattern on a target, said primary pattern including parallel spaced lines;
• forming a plurality of blinder structures in areas of the reticle adjacent to exterior longitudinal and lateral edge portions of the lines of the primary pattern to prevent scattered light from the areas from degrading a projected image of the lines of the primary pattern;
• said blinder structures each comprising at least two parallel spaced blinder lines, each blinder line having a thickness that is less than a resolution of the lithographic apparatus and with an overall width of each blinder structure inclusive of the thicknesses of the blinder lines and a spacing between the blinder lines for each blinder structure, equal to a linewidth of a single line of the primary pattern.

A lithographic method comprising:

• providing a lithographic apparatus having partially coherent or off-axis illumination;
• forming a reticle configured for use with the lithographic apparatus and having a primary pattern comprising spaced lines;
• forming blinder structures in areas of the reticle adjacent to edge portions of the lines to prevent scattered light from the areas from degrading an image of the lines, said blinder structures each comprising at least two parallel spaced blinder lines, each said blinder line having a thickness that is less than a resolution of the lithographic apparatus;
• said blinder structures having an overall width inclusive of the blinder lines that is approximately equal to a linewidth of a single line of the primary pattern, and at least some of said blinder structures having an associated blinder structure for protecting an exposed edge thereof.