Method and apparatus for forming an oxide passivation film on a weld
AssigneesTadahiro Ohmi, Osaka Sanso Kogyo Ltd.
InventorsTadahiro Ohmi, Masakazu Nakamura
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AssigneesTadahiro Ohmi, Osaka Sanso Kogyo Ltd.
InventorsTadahiro Ohmi, Masakazu Nakamura
Estimating the term…
A welding method for forming an oxide passivation film having corrosion resistance and an extremely small emission quantity of an outgas during welding at a weld portion and portions nearby, and a process apparatus requiring an ultrahigh-clean atmosphere. A back-shielding gas comprising an inert gas containing 1 ppb to 50 ppm of oxygen gas is caused to flow during a welding process, and an oxide passivation film comprising chromium oxide as a principal component is formed on the surface of the weld portion. In a process apparatus using welding for installing the apparatus, a back-shielding gas comprising an inert gas containing 1 ppb to 50 ppm of oxygen gas is caused to flow during a welding process and an oxide passivation film comprising chromium oxide as a principal component is formed on the surface of a weld portion.
A welding method for forming an oxide passivation film on a weld, comprising the step of:
An oxide passivation film forming method comprising the steps of:
Dependencies are inferred from the claim text.