Method for repairing a defect generated cell using a laser
AssigneeHyundai Electronics Industries Co., Ltd.
InventorHee Kook Park
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Abstract
The invention provides a method for repairing a defect-generated cell using a laser for disconnecting a defect-generated portion of a fuse conductive line in the fabricating process of semiconductor integrated circuits, characterized in that an insulation layer on the fuse conductive line is isotropically etched partially to a predetermined thickness for the purpose of refracting laser beam incident to the defect-generated portion of the fuse conductive line.
Claims2
A method for repairing a defect-generated cell using a laser beam for disconnecting a defect-generated portion of a fuse conductive line in the fabricating process of semiconductor integrated circuits, characterized in that an insulation layer on the fuse conductive line is isotropically etched forming a concave recess in order to refract the laser beam upon the defect-generated portion of the fuse conductive line.
Dependencies are inferred from the claim text.