Resist material
AssigneeNEC Corporation
InventorKunihiko Kasama
Life of this patent
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Abstract
A vertically orienting compound is added to a chemical amplification type resist to progress acid catalysis during baking after exposure and penetration of a developer in a developing step in the direction of depth of the resist. This improves the resist shape, the dimensional uniformity, and the resolving power in a lithography step.
Claims7
A positive chemical amplification type resist material which contains at least a resin and a photosensitive acid generator and changes solubility thereof by using a catalytic reaction of an acid generated by the photosensitive acid generator, wherein a straight-chain compound having a vertically orienting nature is added.
A negative chemical amplification type resist material which contains at least a resin and a photosensitive acid generator and changes solubility thereof by using a catalytic reaction of an acid generated by the photosensitive acid generator, wherein a straight-chain compound having a vertically orienting nature is added.
Dependencies are inferred from the claim text.