Energy sensitive materials and methods for their use
AssigneeLucent Technologies Inc.
InventorsAjey M. Joshi, Timothy W. Weidman
Life of this patent
Estimating the term…
Abstract
A class of silicon-containing materials display excellent sensitively in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.
Claims23
A process for fabricating an article comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material comprises a silicon polymer represented by the base unit:
- [R.sub.x SiH.sub.yn ]
- where 0.2<x<1.5, 0.2<y<1.5 and R is an organic substituent resulting in said material being insoluble and wherein said developed image is positive.
A process for fabricating a body comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor such that said material comprises a composition represented by the formula [R.sub.x SiH.sub.y ] where 0.2<x<1.5, 0.2<y<1.5 and R is an organic substituent and wherein said pattern is positive.
A process for fabricating a body comprising the steps of forming a layer of radiation sensitive material on a substrate, exposing said material to said radiation to form a pattern and developing said pattern characterized in that said material is formed by discharge in a precursor comprising a composition represented by the formula RSiH.sub.3 wherein R is an organic substituent and wherein said pattern is positive.
Dependencies are inferred from the claim text.