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US 5,635,315 AGranted
Phase shift mask and phase shift mask blank
AssigneeHoya Corporation
InventorMasaru Mitsui
Life of this patent
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AssigneeHoya Corporation
InventorMasaru Mitsui
Estimating the term…
A phase shift mask comprises a transparent substrate (1) provided with a mask pattern formed by a light transmitting portion (4) for transmitting effective light beams having an intensity which substantially contributes to exposure and a light translucent portion (2) for transmitting ineffective light beams having an intensity which does not substantially contribute to exposure. The light translucent portion (2) is for phase shifting the ineffective light beams transmitted therethrough to make the ineffective light beams be different in phase from the effective light beams transmitted through the light transmitting portion (4) that the effective and the ineffective light beams passing through an area in the vicinity of a boundary between the light transmitting portion (4) and the light translucent portion (2) cancel each other so as to assure an excellent contrast at the boundary. The light translucent portion (2) comprises a thin film made of a material containing oxygen, metal, and silicon as main components.
A phase shift mask comprising a transparent substrate transparent to an exposure light beam and a translucent portion selectively deposited on the transparent substrate with a transparent portion left on the transparent substrate and with a boundary left between the translucent and the transparent portions, the exposure light beam being canceled in phase in an area adjacent to the boundary between the translucent and the transparent portions when the exposure light beam passes through the translucent and the transparent portions, said translucent portion being formed by:
A phase shift mask comprising a transparent substrate transparent to an exposure light beam and a translucent portion selectively deposited on the transparent substrate with a transparent portion left on the transparent substrate and with a boundary left between the translucent and the transparent portions, the exposure light beam being canceled in phase in an area adjacent to the boundary between the translucent and the transparent portions when the exposure light beam passes through the translucent and the transparent portions, said translucent portion being formed by:
A phase shift mask blank comprising a transparent substrate transparent to an exposure light beam and a translucent layer deposited on the transparent substrate, said translucent layer being formed by:
A phase shift mask blank comprising a transparent substrate transparent to an exposure light beam and a translucent layer deposited on the transparent substrate, said translucent layer being formed by:
A method of manufacturing a phase shift mask, comprising the steps of:
Dependencies are inferred from the claim text.