Surface position detection apparatus
AssigneeNikon Corporation
InventorHideo Mizutani
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AssigneeNikon Corporation
InventorHideo Mizutani
Estimating the term…
A surface position detection apparatus for detecting a surface position on a surface to be detected, comprises a projection pattern formed on a first surface, a projection optical system for projecting the pattern from an oblique direction onto the surface to be detected, a condensing optical system for condensing a light beam reflected by the surface to be detected, and forming an image of the pattern on a second surface, and a detector for photoelectrically detecting the image of the pattern. The first surface and the surface to be detected are arranged to satisfy a Scheimpflug condition in association with a principal plane of the projection optical system. The surface to be detected and the second surface are arranged to satisfy a Scheimpflug condition in association with a principal plane of the condensing optical system.
A surface position detection apparatus for detecting a surface position of a surface to be detected and for improving the accuracy of position detection in a direction perpendicular to the surface, comprising:
A surface position detection apparatus for detecting a surface position of a surface to be detected, comprising the following parts arranged along an optical path in the order recited:
An exposure apparatus which projects an image of a reticle onto a wafer, comprising the following elements which are arranged along an optical path in the following order:
A method for detecting a position of a surface to be detected, comprising:
A method for transferring an image of reticle onto a wafer placed on a wafer stage, comprising:
Dependencies are inferred from the claim text.