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US 5,633,112 AGranted
Photosensitive resin composition containing a carboxylic acid polymer, photoacid generator and secondary or tertiary aliphatic amine
AssigneesHitachi, Ltd., Hitachi Chemical Company, Ltd.
InventorsTakao Miwa, Yoshiaki Okabe, Mina Ishida, Akio Takahashi, Shunichi Numata
Life of this patent
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Abstract
A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.
Claims8
A photosensitive resin composition comprising
- (a) a carboxylic acid polymer having repeating units represented by the formula (1):
- ##STR7## wherein A is an organic group having 2 or more carbon atoms;
- n is a positive integer between 10 and 200,00;
- and R.sub.1 is an organic group having 1 or more carbon atoms, a hydrogen atom or a halogen atom, the amount of said polymer being 20% or more by weight based on the total amount of the resin in the composition;
- (b) a photoacid generator which is capable of generating an acid upon application of electromagnetic waves, the amount of said acid being 0.2 to 2.0 molar equivalents per mole of the carboxyl group in said carboxylic acid polymer;
- and
- (c) a secondary or tertiary aliphatic amine having 12 or less carbon atoms in an amount of 0.2 to 2.0 molar equivalents per mole of the carboxyl group in said carboxylic acid polymer.
4 more elements
A photosensitive resin composition comprising
- (a) a polymer having carboxyl groups, (b) a photoacid generator and (c) a secondary or tertiary aliphatic amine having 12 or less carbon atoms, and said composition being capable of forming a pattern by application of electromagnetic waves.
Dependencies are inferred from the claim text.