Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound
AssigneeFuji Photo Film Co., Ltd.
InventorsHiroshi Yoshimoto, Kesanao Kobayashi
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Abstract
A positive type or negative type photoresist composition for fine processing having excellent resolution, sensitivity, adhesive-ness and developability comprising: (a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof, (b) a light-sensitive compound, and (c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on a weight of the resin. In addition, the present invention is directed to an etching method utilizing the positive type or negative type photoresist composition.
Claims21
A photoresist composition comprising in admixture:
- (a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof,
- (b) a 1,2-quinonediazide light-sensitive compound, and
- (c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on the weight of the resin,
- wherein said organic compound (c) is selected from the group consisting of compounds represented by formulae (I) and (II):
- ##STR6## wherein n represents 1 or 2, R.sup.1 represents an alkyl group, an alkoxyl group, an aryl group, an aryloxy group, an acyl group, or an acyloxy group,
- R.sup.2 and R.sup.3 each represents a hydrogen atom or an alkyl group, an aryl group, or an acyl group,
- Y represents a single bond, an oxygen atom or a sulfur atom, and
- Z represents an oxygen atom or a sulfur atom,
- and said organic compound may be a salt of a metal or ammonium.
A photoresist comprising a substrate having coated on the surface thereof a photoresist composition comprising in admixture:
- (a) an alkali soluble resin or a resin having anti-alkali dissolution groups in the molecules thereof,
- (b) a 1,2-quinonediazide light-sensitive compound, and
- (c) at least one organic compound selected from the group consisting of organic phosphorus acid compounds and esters thereof in an amount of 0.001 to 10% by weight based on the weight of the resin,
- wherein said organic compound (c) is selected from the group consisting of compounds represented by formulae (I) and (II):
- ##STR7## wherein n represents 1 or 2, R.sup.1 represents an alkyl group, an alkoxyl group, an aryl group, an aryloxy group, an acyl group, or an acyloxy group,
- R.sup.2 and R.sup.3 each represents a hydrogen atom or an alkyl group, an aryl group, or an acyl group,
- Y represents a single bond, an oxygen atom or a sulfur atom, and
- Z represents an oxygen atom or a sulfur atom,
- and said organic compound may be a salt of a metal or ammonium.
Dependencies are inferred from the claim text.