Lithography using a new phase-shifting reticle

A reticle for use in patterning a radiation sensitive layer on a printer, said printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said reticle comprising:

• at least one first region and at least one second region, said first and said second regions transmitting an approximately equal intensity of said radiation incident thereon, wherein said radiation transmitted through said first region is phase-shifted approximately 180.degree. relative to said radiation transmitted through said second region:
• a first area comprising one of said first regions between and adjacent to two of said second regions;
• wherein said first region in said first area has a width of approximately 0.4 IRF *.lambda./NA or less, and wherein intensity of said radiation at the surface of said radiation sensitive layer is insufficient to substantially expose said radiation sensitive layer approximately beneath said first region in said first area due to destructive interference.

A reticle for use and patterning a radiation sensitive layer on a printer, said printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said reticle comprising:

• a plurality of first regions and a plurality of second regions, said first and said second regions transmitting an approximately equal intensity of said radiation incident thereon, wherein said radiation transmitted through said first regions is phase-shifted approximately 180.degree. relative to said radiation transmitted through said second regions;
• a first area, having a pattern comprising said plurality of first regions and said plurality of second regions, said pattern such that intensity of said radiation at the surface of said radiation sensitive layer is insufficient to substantially expose said radiation sensitive layer beneath said first area due to destructive interference between said radiation transmitted through said first regions and said radiation transmitted through said second regions.

A method of patterning a radiation sensitive layer on a substrate comprising:

• depositing said radiation sensitive layer on said substrate;
• exposing a first region and two second regions of said radiation sensitive layer using a printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said first region being between and adjacent to said second regions, wherein said radiation is of approximately equal intensity in said first and said second regions, wherein said radiation in said first region is phase-shifted approximately 180.degree. relative to said radiation in said second regions, such that said radiation in said first region destructively interferes with said radiation in said second regions, such that said radiation sensitive layer is not substantially exposed at least where said first region is adjacent to said second regions, and wherein said first region and said second regions have a width such that intensity of said radiation in center portions of said first and said second regions is sufficient to substantially expose said center portions of said first and said second regions.

A method of patterning a radiation sensitive layer on a substrate comprising:

• depositing said radiation sensitive layer on said substrate;
• exposing a first region and two second regions of said radiation sensitive layer using a printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said first region being between and adjacent to said second regions, wherein said radiation is of approximately equal intensity in said first and said second regions, wherein said radiation in said first region is phase-shifted approximately 180.degree. relative to said radiation in said second regions, such that said radiation in said first region destructively interferes with said radiation in said second regions, and wherein said first region has a width of approximately 0.4 IRF*.lambda./NA or less, such that intensity of said radiation in said first region is insufficient to substantially expose said first region due to destructive interference between said radiation in said first region and said radiation in said second regions.

A method for patterning of radiation sensitive layer on a substrate comprising:

• depositing said radiation sensitive layer on said substrate;
• exposing a plurality of first regions and the plurality of second regions of said radiation sensitive layer on a printer having a numerical aperture (NA), an image reduction factor (IRF) and a wavelength (.lambda.) of exposing radiation, wherein said radiation is of approximately equal intensity in said first and said second regions, wherein said radiation in said first region is phase-shifted approximately 180.degree. relative to said radiation in said second regions;
• exposing a first area comprising a pattern of said first and said second regions, said pattern such that intensity of said radiation is insufficient to substantially expose said radiation sensitive layer in said first area due to destructive interference between said radiation in said first regions and said second regions of said pattern in said first area.

A reticle for use in patterning a radiation sensitive layer on a printer, said printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said reticle comprising:

• at least one first region and at least one second region, said first region and said second regions transmitting an approximately equal intensity of said radiation incident thereon, wherein said radiation transmitted through said first region is phase-shifted approximately 180.degree. relative to said radiation transmitted through said second region;
• a first area comprising one of said first regions and one of said second regions, said first region being adjacent to said second region, wherein intensity of said radiation at the surface of said radiation sensitive layer is insufficient to substantially expose said radiation sensitive layer beneath portions of said first area approximately where said first region and said second region are adjacent to one another due to destructive interference, and wherein said first region and said second region in said first area have a width such that intensity of said radiation is sufficient to substantially expose said radiation sensitive layer beneath portions of said first region and second region disposed a distance from where said first region and said second region are adjacent to one another.

A method of patterning a radiation sensitive layer on a substrate comprising:

• depositing said radiation sensitive layer on said substrate;
• exposing a first region and a second region of said radiation sensitive layer using a printer having a numerical aperture (NA), an image reduction factor (IRF), and a wavelength (.lambda.) of exposing radiation, said first region being adjacent to said second region, wherein said radiation is of approximately equal intensity in said first and second regions, wherein said radiation in said first region is phase-shifted approximately 180.degree. relative to said radiation in said second region, such that said radiation in said first region destructively interferes with said radiation in said second region, such that said radiation sensitive layer is not substantially exposed where said first region is adjacent to said second regions, and wherein said first and said second region have a width such that intensity of said radiation is sufficient to substantially expose said radiation sensitive layer beneath portions of said first region and second region disposed a distance from where said first region and said second region are adjacent to one another.