Back to results
US 5,632,820 AGranted
Thermal treatment furnace in a system for manufacturing semiconductors
AssigneeKokusai Electric Corporation
InventorsTomoshi Taniyama, Hideki Kaihotsu, Yoshikatsu Kanamori, Kazuhito Ikeda, Shuji Yonemitsu
Life of this patent
Estimating the term…
Abstract
A thermal treatment furnace for use with a semiconductor system is provided. The thermal treatment furnace includes a scavenger which sealingly encloses a lower end of a reaction tube so as to diminish gas leakage from the reaction tube.
Claims10
A thermal treatment furnace for use with a semiconductor production system, comprising:
- a heater base:
- a heater disposed on the heater base;
- a reaction tube disposed partially within the heater, the reaction tube having a lower end extending out of the heater;
- and
- a scavenger sealingly enclosing the periphery of the lower end of the reaction tube.
2 more elements
Dependencies are inferred from the claim text.