Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKazumasa Wakiya, Masakazu Kobayashi, Toshimasa Nakayama
Life of this patent
Estimating the term…
Abstract
A liquid coating composition for forming an anti-interference film over a photoresist film is prepared by combining a water-soluble, film-forming component with a specified fluorosurfactant or by combining said water-soluble, film-forming component with a fluoro-surfactant and a specified anionic surfactant. A coating film is formed from said liquid coating composition over a photoresist film to produce a photoresist material of a dual structure. The photoresist material is particularly effective in lessening the multiple-interference effect of light, thereby enabling the formation of very fine resist patterns having high fidelity to mask patterns.
Claims18
In a liquid coating composition for use in forming a photoresist coating film comprising a water-soluble, film-forming component and a fluorosurfactant, the improvement wherein said fluorosurfactant is at least one member selected from the group consisting of the salt of a compound represented by the following general formula (I):
- RfCOOH (I)
- (where Rf is a fluorohydrocarbon group having part or all of the hydrogen atoms in a C.sub.2 -C.sub.20 saturated or unsaturated hydrocarbon group replaced by fluorine atoms) with an alkanolamine and the salt of a compound represented by the following general formula (II):
- R'fSO.sub.3 H (II)
- (where R'f is a fluorohydrocarbon group having part or all of the hydrogen atoms in a C.sub.2 -C.sub.20 saturated or unsaturated hydrocarbon group replaced by fluorine atoms) with an alkanolamine.
In a liquid coating composition for use in forming a photoresist coating film comprising a water-soluble, film-forming component and a fluorosurfactant, the improvement wherein the composition further contains at least one anionic surfactant represented by the following general formula (III):
- ##STR7## (where R.sub.1 is an alkyl group having 5 to 18 carbon atoms;
- R.sub.2 is a hydrogen atom or an alkyl or alkoxy group having 5 to 18 carbon atoms;
- R.sub.3 is an N-substituted or unsubstituted ammonium sulfonate group of the general formula
- --SO.sub.3 NZ.sub.4,
- each Z being, independently from the others, a hydrogen atom, alkyl group having 1 to 2 carbon atoms or hydroxyalkyl group having 1 to 2 carbon atoms;
- and R.sub.4 and R.sub.5 are each a hydrogen atom or an N-substituted or unsubstituted ammonium sulfonate group of the general formula --SO.sub.3 NZ.sub.4, Z having the same meaning as defined above).
In a liquid coating composition for use in forming a photoresist coating film comprising a water-soluble, film-forming component and a fluorosurfactant, the improvement wherein the composition further comprises at least one anionic surfactant represented by the following general formula (III):
- ##STR8## (where R.sub.1 is an alkyl or alkoxy group having 5 to 18 carbon atoms;
- R.sub.2 is a hydrogen atom or an alkyl or alkoxy group having 5 to 18 carbon atoms;
- R.sub.3 is an N-substituted or unsubstituted ammonium sulfonate group of the general formula
- --SO.sub.3 NZ.sub.4,
- each Z being, independently from the others, a hydrogen atom, alkyl group having 1 to 2 carbon atoms or hydroxyalkyl group having 1 to 2 carbon atoms;
- and R.sub.4 and R.sub.5 are each a hydrogen atom or an N-substituted or unsubstituted ammonium sulfonate group of the general formula --SO.sub.3 NZ.sub.4, Z having the same meaning as defined above) and an N-alkyl-2-pyrrolidone represented by the following general formula (VI):
- ##STR9## (where R.sub.10 is a C.sub.6 -C.sub.20 alkyl group).
Dependencies are inferred from the claim text.