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US 5,631,050 AGranted
Process of depositing thin film coatings
AssigneeThe BOC Group, Inc.
InventorMichael Thwaites
Life of this patent
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Abstract
A process of depositing thin film coatings by evaporation in which a plasma is formed in an evacuated chamber and a source of material to be evaporated is provided which is evaporated to produce evaporated material. A substrate to be coated is located within the chamber and the evaporated material is caused to pass through the plasma and be to be deposited on the substrate. The plasma is generated by a helicon wave.
Claims9
A process of depositing thin film coatings by evaporation comprising:
- forming a plasma in an evacuated chamber;
- providing a source of material to be evaporated and evaporating material to produce evaporated material;
- locating a substrate to be coated in the chamber;
- and
- causing the evaporated material to pass through the plasma and be to be deposited on the substrate;
- the plasma being generated by a helicon wave.
3 more elements
Dependencies are inferred from the claim text.