US 5,629,236 A · Method of manufacture of semiconductor device

Abstract

The method of manufacturing a semiconductor device, according to the present invention, includes the steps of forming a polycrystal lower-level Al wiring layer on a silicon substrate, forming an interlayer insulation film for covering the lower-level Al wiring layer on the entire surface, forming a connection hole which reaches the lower-level Al wiring layer in the interlayer insulation film, forming a polycrystal upper-level Al wiring layer on a surface of the interlayer insulation film, forming an interlayer insulation film for covering the upper-level Al wiring layer on the entire surface, and forming a single-crystal lower-level Al wiring layer and upper-layer Al wiring layer which are connected to each other in the connection hole by heating the silicon substrate so that the lower-level Al wiring layer and the upper-level Al wiring layer are converted from a polycrystal phase to an amorphous phase, and then cooling the silicon substrate so that the upper-level Al wiring layer is set in a supercooling state.

Claims11

Dependent claims

A method of manufacturing a semiconductor device, comprising the steps of:

forming a first wiring layer made of a material of a crystal phase, on a surface of a substrate;
forming a first insulation film for covering said first wiring layer, on said first wiring layer;
forming a connection hole which reaches said first wiring layer in said first insulation film;
forming a conductive film made of a material of a polycrystal phase, on said first insulation film;
forming a second wiring layer on said first insulation film, by processing said conductive film;
forming a second insulation layer for covering said second wiring layer, on said second wiring layers;
removing a surface of said second insulation film until a surface of said second wiring layer is exposed;
forming an opening which reaches said first wiring layer without interfering with said second wiring layer, by etching said first and second insulation films;
and
converting said first and second wiring layers into first and second single-crystal wiring layers which are connected to each other in said connection hole and are disconnected in said opening, by increasing a temperature of said substrate so that the material of said first wiring layer is converted from a crystal phase to an amorphous phase and the material of said second wiring layer is converted from a polycrystal phase to an amorphous phase, and then decreasing the temperature of said substrate so that these materials are set in a supercooling state.

7 more elements

A method of manufacturing a semiconductor device, comprising the steps of:

forming a first wiring layer made of a material of a crystal phase, on a surface of a substrate;
forming an insulation film for covering said first wiring layer, on said first wiring layer;
forming a connection hole which reaches said first wiring layer in said insulation film, and a wiring groove in a surface of said insulation film;
forming a conductive film made of a material of a polycrystal phase, on said insulation film;
forming a second wiring layer in said connection hole and in said wiring groove by removing a portion of said conductive film except for those portions remaining in said connection hole and said wiring groove;
forming an opening which reaches said first wiring layer without interfering with said second wiring layer, by etching said insulation film;
and
converting said first and second wiring layers into first and second single-crystal wiring layers which are connected to each other in said connection hole and are disconnected in said opening, by increasing a temperature of said substrate so that the material of said first wiring layer is converted from a crystal phase to an amorphous phase and the material of said second wiring layer is converted from a polycrsytal phase to an amorphous phase, and then decreasing the temperature of said substrate so that these materials are set in a supercooling state.

5 more elements

A method of manufacturing a semiconductor device, comprising the steps of:

forming a first wiring layer made of a material of a crystal phase, on a surface of a substrate;
forming an insulation film for covering said first wiring layer, on said first wiring layer;
forming a connection hole which reaches said first wiring layer and an opening in said insulation film, and a wiring groove in a surface of said insulation film;
forming a conductive film made of a material of a polycrystal phase, on said insulation film;
forming a second wiring layer in said connection hole, said opening and in said wiring groove by removing said conductive film except for those portions remaining in said connection hole, said opening and said wiring groove;
and
converting said first and second wiring layers into first and second single-crystal wiring layers which are connected to each other in said connection hole and are disconnected in said opening, by increasing a temperature of said substrate so that the material of said first wiring layer is converted from a crystal phase to an amorphous phase and the material of said second wiring layer is converted from a polycrsytal phase to an amorphous phase, and then decreasing the temperature of said substrate so that these materials are set in a supercooling state.

4 more elements

Dependencies are inferred from the claim text.

Method of manufacture of semiconductor device

Life of this patent

Method of manufacture of semiconductor device

Life of this patent

Abstract

Claims11