Chemically amplified positive resist composition
AssigneesShin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corporation
InventorsKatsuyuki Oikawa, Toshinobu Ishihara, Fujio Yagihashi, Akinobu Tanaka, Yoshio Kawai, Jiro Nakamura
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Abstract
In a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, an acid generator, and an optional dissolution inhibitor, a salt of a pyridine which may have an alkyl, alkoxy, amino or dialkylamino group with an alkylsulfonic acid, arylsulfonic acid or halogen atom is blended. Because of high sensitivity to deep UV and resolution and elimination of the PED problem causing T-top pattern configuration and the skirting phenomenon, the resist composition is improved in dimensional precision and lends itself to fine patterning.
Claims19
A composition comprising
- (A) an organic solvent,
- (B) an alkali soluble resin having an acid unstable group,
- (C) optionally a dissolution inhibitor having an acid unstable group,
- (D) an acid generator other than a pyridine salt, and
- (E) a pyridine salt of formula (1):
- ##STR5## wherein R is a hydrogen atom, an alkyl, an alkoxy, an amino, or a dialkyl amino group and Y is an alkylsulfonic acid, an arylsulfonic acid, or a halogen atom,
- wherein said composition is a chemically amplified positive resist composition.
A composition comprising
- (A) an organic solvent,
- (B) an alkali soluble resin having an acid unstable group,
- (C) optionally a dissolution inhibitor having an acid unstable group,
- (D) 0.05 to 0.4 parts by weight per 100 parts by weight of a pyridine salt of formula (1) ##STR7## wherein R is a hydrogen atom, an alkyl, an alkoxy, an amino, or a dialkyl amino group and Y is an alkylsulfonic acid, an arylsulfonic acid, or a halogen atom, and
- (E) 1 to 20 parts by weight of an acid generator other than the pyridine salt of formula (1), wherein said composition is a positive resist composition.
Dependencies are inferred from the claim text.